RI Research Instruments GmbH (Germany)
Products
EUV-Mask Blank Reflectometer
Application
Semiconductor actinic EUV tools measuring EUV Reticle reflectivity & pellicle transmission measurement for HVM.
supply tools and components for the EUV spectral range (≈13.5 nm) for actinic investigations based on our Xenon and Tin Lab metrology sources.
Providing EUV, XUV and soft X-ray laboratory sources, systems and solutions
Features
Wavelength accuracy of better than 2 pm for CWL_50
Less than 20 seconds spot exposure time (fast mode, high throughput option < 10 s)
Small Spot of < 500*100 μm²
2000 spectral channels of 1.7 pm width.
Precision on reflectivity:< 0.15 % abs.
Accuracy on reflectivity: < 0.5 % abs.
Resolution limit on absorbers: < 0.1 %
Fiducial mark referenced positioning
RSP 200 loader robot
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[ EUV-MBR ]