Fractilia, LLC. (USA)
Product : Leading software tool for solving stochastics issues
The patented technology delivers the most accuracy and ease-of-use for measurement of pattern roughness, defectivity, LCDU, tip-to-tip and numerous other critical metrics for the semiconductor industry.
Application
Control and Predict stochastics related defects including EUV lithography
Highest precision CD measurement & Roughness measurements (LWR, LER, PSD)
Measurement of LCDU, GCDU, EPE, Pattern Placement Error and many other key metrics, accurate even for high-noise images
Accuracy on any patterning technology at any node at any process step : EUV, 193, 193i, SADP, SAQP, SAOP, DSA and more
Solutions
MetroLER™ provides accurate measurement of unbiased roughness, LCDU, defectivity, CD and dozens of other metrics from SEM images for engineering use cases.
FAME™ provides accuracy and precision for all SEMs in a fab and automatically ouputs more than 100 accurate measurements of stochastics enabling numerous new fab-wide use cases that can provide improved scanner OEE, enhanced process control, new process alarms and faster tool qualification.
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