Lumina Instruments (USA)
Products
Lumina AT1 - Manual loading for samples up to 300mm x 300mm
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[ AT1 ]
Lumina AT2 – Up to 450mm x 450mm with optional wafer bow measurement
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[ AT2 ]
Lumina LP1 – Up to 600mm x 600mm with optional wafer bow measurement
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[ LP1 ]
Lumina AT2-EFEM - Fully automated system for 300mm wafers with bow measurement
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[ AT2-EFEM ]
Application
SIC, Glass Substrate, Compound Semi,Blank Photomask, AR/VR Optics
Features
By utilizing four detection channels operating simultaneously, Lumina’s patented technology offers unmatched performance, enhancing yield control and process management in key industries
Polarization: Film Defects, Stains
Reflectivity: Scratches, Internal Stress, Striations within Glass
Slope: Scratches, Pits, Bumps, Surface Topography
Dark Field: Nanoparticles, Inclusions
No backside interference on thin transparent samples (< 100um thickness)
Work with bow/warp samples
High PSL sensitivity on glass substrates (150nm)
Can detect stains as thin as 5 Å
Optional diamond scribe to mark defects for further analysis.
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