RENA Technologies GmbH (Germany)
Products
BatchTex N400 / N600
InOxSide
InPolySide
Application
Wet processing for PERC , TopCon, SHJ (Heterojunction), IBC
Wet Etching/Cleaning/Texturing/Edge Isolation
Features
BatchTex: High Performance Texturing
- Perfect alkaline texturing performance by latest monoTEX H technology
- Hi-Eta Cleaning Process
- Production capacity > 1GW per year with single N600 tool
InPolySide 3+: Inline Single Side Poly Etching
- Based on new 6-lane platform
- >4800 wph throughput (based on 6-lane M10)
- Full flexibility in wafer size: M0 up to M12+
- Poly-Si wrap around removal
- Pre-Oxide Etch, Poly-Etching & Shunt Etch, cleaning/glass etching and rinsing steps
- All-inline processing – no additional handling
InOxSide 3+: Inline junction isolation and rear side polish
- Based on new 6-lane platform
- >5100 wph throughput (based on M10)
- available as version with alkaline (InOxSide Blue) or acidic etching (InOxSide Acidic)
- Compatible with PERC and TopCon
- Full flexibility in wafer size: M0 up to M12+
- Etching, cleaning and rinsing steps
- All-inline processing – no additional handling
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[ BatchTex 3 N600: mono-Texturing Performance ] -
[ InOxSide 3+: Inline junction isolation & Polish ] -
[ InPolySide 3+: Inline Single Side Poly Etching ]
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