Oxford Instruments Pte. Ltd. (UK)
Etch, Deposition and Growth Systems
- Etch Process: ALE, ICP, Plasma Polish, RIE & DSiE
- Deposition Process: ALD, ICPCVD & PECVD
- Growth Processes: CVD & PECVD
- Ion Beam: IBE, IBD & IBE/IBD
Application
Optoelectronic device
Semiconductor device manufacture
Plasma process solution for MEMS & sensor
Features
Standalone load lock & cluster system
Auto matching unit & logging
Wide process range
Active uniformity control
Bosch / Cryo ICP process
Multi-module range
Multi-step processing without breaking vacuum
Simultaneous processing for higher throughput
Designed for high volume/value manufacturing
Controllable, repeatable processes via recipe-driven software interface
Cassette to cassette handling
Website